hafnium


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Related to hafnium: Hafnium carbide

hafnium

 (Hf) [haf´ne-um]
a chemical element, atomic number 72, atomic weight 178.49. (See Appendix 6.)

haf·ni·um (Hf),

(haf'nē-ŭm),
A rare chemical element, atomic no. 72, atomic wt. 178.49.
[L. Hafnia, Copenhagen]

haf·ni·um

(Hf) (haf'nē-ŭm)
A rare chemical element, atomic no. 72, atomic wt. 178.49.
[L. Hafnia, Copenhagen]
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ACI Alloys Alkane Resources Orano ATI Metals CXMET China Nulear Jinghuan Zirconium Leading Edge Materials Nanjing Youtian Metal Technology Phelly Materials Shenzhen Xinxing Metal Technology State Nuclear Wec Zirconium Hafnium
Considering that the melting point of the hafnium nitride in coating form is high compared to materials such as steel, we can conclude that there is less adhesion of the material to the cutting tool, due to a lower working temperature [31].
The elements identified in case of Thar 3-2-3 coal sample, were Aluminum, Arsenic, Barium, Bromine, Calcium, Cobalt, Chromium, Copper, Iron, Gallium, Hafnium, Lanthanum, Manganese, Molybdenum, Niobium, Neodymium, Nickel, Rubidium, Antimony, Scandium, Selenium, Silicon, Tin, Strontium, Titanium, Uranium, Vanadium, Ytterbium, Yttrium, Zink and Zirconium.
(21) The starting materials were hafnium tetrachloride (Hf[Cl.sub.4]) and sodium hydroxide (NaOH).
Michael Bau from the Jacobs University Bremen), came to the surprising result - 2,700 million years ago, seawater contained an unusually high abundance of the radioactive isotope Hafnium 176 but a comparably low abundance of the radioactive isotope Neodymium 143, similar to what can be observed in present day seawater.
During high-temperature annealing, the hafnium atom diffused the IGZO thin film easily, and caused interface roughness because of the stability between the Hf[O.sub.2] dielectric thin film and IGZO thin film.
Aluminum, hafnium, titanium, zirconium, vanadium, tantalum, and copper alkoxides have all been reported to form oxide thin films.
NBTXR3, the lead compound of Nanobiotix's NanoXray product pipeline, is a nanoparticle formulation of hafnium oxide crystals for the local treatment of tumors to enhance the efficiency of radiotherapy.
Row 6 (cesium, barium, lanthanum, hafnium, tantalum, tungsten, rhenium, osmium, iridium platinum, gold, mercury, thallium, lead, bismuth, polonium, astatine, and radon) have themes of responsibility, leadership, and power.
Meanwhile, active brazing does not require a metalized layer because it is a method that enables direct joining to ceramics with a single application of heat by improving the wettability (ease of application) to ceramics by adding active metal such as Ti, zirconium (Zr), hafnium (Hf), etc.
hafnium (HfO2) emerges from all likely candidates to become the new gold standard in the microelectronics industry.