etching

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etching

 [ech´ing]
the cutting of a hard surface such as metal or glass by a corrosive chemical, usually an acid, in order to create a design.
acid etching etching of dental enamel with an acid in order to roughen the surface, increase retention of resin sealant, and promote mechanical retention.

etching

[ech′ing]
the cutting of a hard surface, such as metal or glass, by a corrosive chemical, usually an acid, to create a design.

etching,

n a process used to decalcify the superficial layers of enamel as a step in the application of sealants or bonding agents in preventive dentistry and orthodontics. The agent of choice is phosphoric acid in concentrations of 30% to 40%.

etching

References in periodicals archive ?
The etch profile does not depend on the crystal orientation of the silicon wafer.
Incorporating unique, patented etch and deposition technologies, Tegal's system solutions are backed by over 35 years of advanced development and over 100 patents.
Applied has an installed base of over 60 AdvantEdge metal etch process chambers being used in production at Flash and DRAM customer fabs worldwide.
This order once again demonstrates Aviza's ability to continually deliver superior deep silicon etch process technology to the MEMS market," said Kevin T.
For more information on the Applied AdvantEdge Etch system, please visit http://www.
The Tegal 6540 used in this application features the unique dual-frequency Hre- etch process module upgraded with a high temperature ESC capable of processing at wafer temperatures as high as 500C.
The Tegal 980ACS is the latest in a long series of plasma etch systems produced by Tegal for companies around the world.
The Applied Centura(R) AdvantEdge Metal Etch system features a fully-integrated, optimized combination of etch and strip process chambers on its multi-chamber Centura platform.
With extensive automation and fab-ready connectivity, the versatile AFP represents a truly complete solution for in-line CMP and Etch process monitoring and control.
Typical applications for the 901ACS include nitride etch, photoresist descum, polyimide and BCB etches, zero layer etch, backside etch, isotropic oxide etch, non-critical polysilicon etch and titanium/tantalum alloy etch.
Based on Applied Materials' production-proven DPS process chamber design, the AdvantEdge system provides a comprehensive set of solutions for silicon etch applications, including gate and STI (shallow trench isolation), with demonstrated extendibility for 45 and 32nm high-k and metal gate structures.
Tegal Corporation (Nasdaq:TGAL), a leading designer and manufacturer of plasma etch and deposition systems used in the production of integrated circuits and nanotechnology devices, today announced that a major European integrated device manufacturer that had previously placed a multiple system order with Tegal has increased the order to include additional 6540 advanced etch systems.