Established in 1989, CALIBRE
is an employee-owned management and technology services company.
When coupled with Calibre
LVS for device modeling, Calibre
xRC and Calibre
xL help designers address parametric yield issues by accurately capturing process variation effects in device and interconnect models.
PCell Xtreme[TM] supports legacy PCells and enables Calibre
nmDRC to read OpenAccess databases containing PCells written in proprietary languages from any vendor; and
To reduce the risk of silicon failure and enable acceptable yield under challenging low k1 conditions, Calibre
nmOPC uses both dense simulation capabilities, which provide 100 percent simulation coverage for the mask layer, and process window correction optimization algorithms to ensure silicon-patterning success.
There are clear benefits when designers adopt a comprehensive physical verification flow using the market leading Calibre
tool suite, which includes Calibre
nmDRC (design rule check), Calibre
LVS (layout vs.
Mentor Graphics' Calibre
nmDRC on the Intel Dual-Core Xeon 5160 processor is bringing higher productivity to our end customers by combining the benefits of Calibre
's Hyperscaling technology and Intel's leading dual-core computing performance.
These basic components of physical verification are being augmented by an expansive set of yield analysis and critical feature identification capabilities as well as layout enhancements, and printability and performance validation, all of which Mentor addresses with the Calibre
We've seen outstanding results with the new Hyperscaling technology in Calibre
nmDRC," said Kun-Cheng Wu, Design Development Director of Faraday Technology.
More specifically, the Calibre
LFD tool addresses the urgent issue of how to manage lithographic process variability in the early stages of design creation.
platform is known throughout the industry as a technology leader for the design-to-silicon handoff," added Todd Moyer, director of mixed signal engineering at Enuclia.
More specifically, Calibre
LFD(TM) is the first production-proven EDA tool to address the urgent issue of how to manage lithographic process variability in the early stages of design creation.
LFD is the first, production proven, electronic design automation (EDA) tool to address the urgent issue of how to manage process variability in the early stages of design creation.