anneal

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anneal

 [ah-nēl´]
1. to heat a material, such as glass or metal, followed by controlled cooling to remove internal stresses and induce a desired degree of toughness, temper, or softness of the material.
2. to homogenize an amalgam alloy ingot by heating it in an oven.
3. to heat a material, such as gold foil, to volatilize and drive off impurities from its surface, and to increase its cohesive properties.

an·neal

(an-nēl'),
1. To soften or temper a metal by controlled heating and cooling; the process makes a metal more easily adapted, bent, or swaged, and often less brittle.
2. In dentistry, to heat gold leaf preparatory to its insertion into a cavity, to remove adsorbed gases and other contaminants.
3. The pairing of complementary single strands of DNA; or of DNA-RNA.
4. The attachment of the ends of two macromolecules, for example, two microtubules annealing to form one longer microtubule.
5. In molecular biology, annealing is a process in which short sections of single-stranded DNA from one source are bound to a filter and incubated with single-stranded, radioactively conjugated DNA from a second source. Where the two sets of DNA possess complementary sequences of nucleotides, bonding occurs. The degree of relatedness (homology) of the two sets of DNA is then estimated according to the radioactivity level of the filter. This technique plays a central role in the classification of bacteria and viruses. Synonym(s): nucleic acid hybridization
6. To renature proteins or polynucleic acids by slow cooling.
[A.S. anaelan, to burn]

an·neal

(ă-nēl')
Process by which oligonucleotides affix to targeted DNA sequences.
[A.S. anaelan, to burn]

an·neal

(ă-nēl')
In dentistry, to heat gold leaf preparatory to its insertion into a cavity to remove adsorbed gases and other contaminants.
[A.S. anaelan, to burn]
References in periodicals archive ?
The WAXS patterns in the range of 2[THETA] 5[degrees]-45[degrees] for nonannealed and annealed PDO specimens under various conditions are shown in Fig.
To verify the above results, the microstructures of the specimens annealed at different temperatures were investigated.
As displayed in Figure 6(a-1,a-2), when annealed in simulated atmosphere, the fibres surface has formed compact oxide film and the cross section is relatively flat.
Consequently, the value of [alpha] was found to be around 2 from 120 K to 260 K and from 90 K to 230 K in the Ge NCs films annealed at 400 and 500[degrees]C, respectively.
Our results are in agreement with these previous outcomes as our ex situ annealed films, which got into contact with ambient air, were crystallized into hexagonal phase.
Figure 4 shows the TEY XAS spectra for a sample magnetization parallel ([[rho].sub.+]) and antiparallel ([[rho].sub.-]) to the photon helicity vector for a pure Co foil, the as-deposited film, and the annealed film.
Caption: Figure 5: Reflectance spectra of n-Si/PEDOT:PSS samples annealed at different temperatures from 160[degrees]C to 190[degrees]C, and the reflectance spectrum of the polished bare n-Si is also shown for a reference.
The dissipation energy and residual depth of the specimen annealed at 823 K are larger than those of the specimens annealed at 723 K and 773 K.
Table 1 shows the atomic ratios of Sn to S in deposited and thermally annealed CdS/SnS and ZnS/SnS films.
1 shows XRD patterns of bismuth iron oxide thin films prepared using sol-gel method under as-deposited, 200C and 300C annealed conditions.
Figure 4 shows the initial discharge curves of the as-deposited and annealed LiNi[O.sub.2] thin films.
According to (1) and (2), average residual stresses and thermal stress in Pt/Ti layer annealed were summarized in Table 1.