secondary ion mass spectrometry

(redirected from Secondary Ion Mass Spectroscopy)

secondary ion mass spectrometry

A technique of mass spectrometry in which a beam of energised ions (appoximately 5 keV in energy) is used to sputter sample atoms and molecules from a thin solid film or surface (classic SIMS), or organic molecules that may be present as a thin film or dissolved in a liquid or solid solution (molecular SIMS or liquid SIMS) held on the surface of a beam-intersecting sample probe.
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Tenders are invited for Supply, installation and commissioning of time of flight secondary ion mass spectroscopy (tof-sims)
Among the topics are instrumental isotopic fractionation, measurement strategies, chemical imaging, inductively coupled plasma mass spectroscopy, thermal ionization mass spectrometry, secondary ion mass spectroscopy, and gas source isotope ratio mass spectrometry for analyzing noble gases.
This report segments the said market based on technology involving secondary ion mass spectroscopy (SIMS), energy dispersive X-ray spectroscopy (EDS/EDX), chemical mechanical planarization (CMP), focused ion beam (FIB), broad ion milling (BIM), and reactive ion etching (RIE), and also based on geography.
Secondary ion mass spectroscopy accounted for majority market share in the year 2012 owing to several advantages over other technologies such as the ability to identify all elements, and the ability to identify elements present in very low concentration levels.
Secondary ion mass spectroscopy (SIMS) profiles were measured in a time of-flight mode using 25 keV Ga as an ion source.
Secondary ion mass spectroscopy (SIMS) and auger electron spectroscopy (AES) applied to the fire investigation for short circuit, In Proc.
Paris, France 7/4/05; Hillsboro, OR 7/11/05--Cameca has acquired the assets and quadrupole secondary ion mass spectroscopy system (SIMS) technology of Atomika from FEI.
The extent of probe segregation to the interface was also investigated using Secondary Ion Mass Spectroscopy (SIMS).
Other instrumentation-based technologies included Auger spectroscopy, secondary ion mass spectroscopy (SIMS), x-ray photoelectron spectroscopy (XPS), helium leak detection, and x-ray diffraction (XRD).
The secondary ion mass spectroscopy analysis was performed on a SIMS II using a 200-[micro]m diameter spot.

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