photocell

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Related to Photoresist: photolithography

photocell 

Physical receptor that produces electric current when light is incident upon it. Syn. photoelectric cell.
References in periodicals archive ?
Samsung, for instance, has stepped up testing of non-Japanese photoresists and hydrogen fluoride, several sources familiar with the chip supply chain said.
Photoresist, a sort of material indispensable to PCB, flat panel display, optoelectronic devices, among others, keeps expanding in market size amid the robust demand from downstream sectors.
The high-end photoresist made in Japan is currently used by Samsung, which began to apply it for its EUV process since late last year.
Rather than using dots, the equipment writes computer-generated diffractive features composed of small rectangular pixels (although pixels of any shape are possible), and other profiles and structures directly into the photoresist using lasers.
The same process of applying photoresist and etching follows as above, and this leaves only the traces required by the designer for each specific layer.
Further, a high thermal stability of the binder polymer that corresponds to the photosensitive polyimide in the positive-tone photoresist is required.
The report covers the present scenario and the growth prospects of the global semiconductor photoresist stripping market for 2016-2020.
For devices fabricated with multiple levels of lithography, requiring spin-coating of photoresist over patterned features and alignment between subsequent levels of lithography, observe the following guidelines.
Following the resist synthesis, characterization will need to be performed to determine photoresist suitability.
When using conventional spin coaters in the photoresist coating process, stepped parts are not sufficiently covered with photoresist.
We uniformly disperse the negative photoresist with spin-coating method on in the film.
Spherical microlens pattern using photoresist material was designed on the backside of OLEDs substrate by conventional etching method to minimize the total internal reflection loss at substrate/air interface, and an enhancement of 1.65 could be obtained with high refractive index glass as substrate [17].