electron beam

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e·lec·tron beam

a form of radiation used principally in superficial radiotherapy. See: betatron.

e·lec·tron beam

(ĕ-lektron bēm)
Form of radiation used principally in superficial radiotherapy.

electron

any of the negatively charged particles arranged in orbits around the nucleus of an atom and determining all of the atom's physical and chemical properties except mass and radioactivity. Electrons flowing in a conductor constitute an electric current; when ejected from a radioactive substance, they constitute the beta particles.

electron acceptor
see oxidant.
electron beam
the stream of electrons that flows from the anode to the cathode in the x-ray tube and then interacts with the tungsten target to produce x-rays.
electron carrier
a molecule associated with membrane-bound proteins that accepts and transfers electrons.
electron donor
electron micrographs
photographic images of electron microscopic fields.
electron microscope
see electron microscope.
electron microscopy
technology of using an electron microscope.
References in periodicals archive ?
Micro-mirror devices are originated using a combination of electron beam lithography and photolithography.
With the acquisition of the lithography system and its unique nanoscale patterning capabilities, the Penn State Nanofabrication Laboratory will have one of the most advanced electron beam lithography systems for nanotechnology research and development.
Vistec EBPG5200 system users benefit from more than thirty years of experience that Vistec has gained in the electron beam lithography business.
DTR technology utilizes an electron beam lithography system developed in research related to the "Nanometer-Scale Optical High Density Disk Storage System", a national project supported by Japan's New Energy and Industrial Technology Development Organization (NEDO).
Diamond devices are conventionally made using ""top-down"" processing following the seeding and growth of nanocrystalline diamond thin films, however, due to the great resilience of diamond, fabricating nanoscale devices is technologically demanding and nanoscale patterning requires expensive and lengthy processing such as electron beam lithography (EBL).
Beyond its new imaging and analytical performance, the NOVA NanoSEM 30 series also provides researchers with novel prototyping capabilities based on electron beam lithography, electron beam induced deposition and in-situ experimentation for manipulation and testing.
Contract notice: Delivery of an electron beam lithography system.
com), a developer of electron beam lithography systems for the worldwide semiconductor industry, has selected Grant Technologies (www.
Contract notice: Electron Beam Lithography Equipment and Data Prep System
from Princeton University, Warren Grobman served IBM as a research scientist, led the company's electron beam lithography effort, started the synchrotron X-ray lithography program, was head of the Semiconductor Technology Development Laboratory and program director for the GaAs joint program with IBM Fishkill and Rockwell International, and was program director of technology modeling.

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