About MEI's Critical Etch
wet processing system-a new approach.
Incorporating unique, patented etch
and deposition technologies, Tegal's system solutions are backed by over 35 years of advanced development and over 100 patents.
Applied has an installed base of over 60 AdvantEdge metal etch
process chambers being used in production at Flash and DRAM customer fabs worldwide.
This order once again demonstrates Aviza's ability to continually deliver superior deep silicon etch
process technology to the MEMS market," said Kevin T.
For more information on the Applied AdvantEdge Etch
system, please visit http://www.
The Applied Centura(R) AdvantEdge Metal Etch
system features a fully-integrated, optimized combination of etch
and strip process chambers on its multi-chamber Centura platform.
With extensive automation and fab-ready connectivity, the versatile AFP represents a truly complete solution for in-line CMP and Etch
process monitoring and control.
Typical applications for the 901ACS include nitride etch
, photoresist descum, polyimide and BCB etches
, zero layer etch
, backside etch
, isotropic oxide etch
, non-critical polysilicon etch
and titanium/tantalum alloy etch
Based on Applied Materials' production-proven DPS process chamber design, the AdvantEdge system provides a comprehensive set of solutions for silicon etch
applications, including gate and STI (shallow trench isolation), with demonstrated extendibility for 45 and 32nm high-k and metal gate structures.
Tegal Corporation (Nasdaq:TGAL), a leading designer and manufacturer of plasma etch
and deposition systems used in the production of integrated circuits and nanotechnology devices, today announced that a major European integrated device manufacturer that had previously placed a multiple system order with Tegal has increased the order to include additional 6540 advanced etch
TOKYO -- Tokyo Electron (TEL), the leader in Dielectric etch
systems, announced today that it will begin accepting orders in late August 2005 for the new SCCM(TM) chamber, development code JIN, a next generation chamber for BEOL dielectric etch
today announced that its breakthrough Applied Centura(R) Enabler(R) Etch
system is a recipient of Semiconductor International (SI) magazine's 2005 Editors' Choice Best Product Award.